Picosun's PicoArmourTM reduces semiconductor manufacturing costs

"Picosun's approach with PicoArmourTM is to combine the highly-etch-resistant Y2O3 ALD process with more robust ALD processes. A high performance ALD corrosion barrier combining the speed and convenience of Al2O3 process with the durability of Y2O3 can be achieved by carefully controlling the film composition. With ALD, the protective effect can be achieved with thinner films, which in turn leads to material savings and a more environmentally friendly process", states Juhana Kostamo, VP, Industrial Business Area of Picosun Group.

Finland, 02/06/2021 (informazione.news - comunicati stampa - elettronica)

"Picosun's approach with PicoArmour is to combine the highly-etch-resistant Y O ALD process with more robust ALD processes. A high performance ALD corrosion barrier combining the speed and convenience of Al O process with the durability of Y O can be achieved by carefully controlling the film composition. With ALD, the protective effect can be achieved with thinner films, which in turn leads to material savings and a more environmentally friendly process", states Juhana Kostamo , VP, Industrial Business Area of Picosun Group.

To learn more about PicoArmour and a study Picosun has done related to protective coatings against plasma damage, join Picosun talk at the virtual ALD 2021 conference on June 29 at 10:25 am EDT . Register here.

*Values dependent on deposition and etch parameters

More information:

Juhana Kostamo
Vice President, Industrial Business Area, Picosun Group
Tel: +358 50 369 9565
Email: info@picosun.com 
www.picosun.com

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https://news.cision.com/picosun-oy/r/picosun-s-picoarmour-tm--reduces-semiconductor-manufacturing-costs,c3358445

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