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PICOSUN® Sprinter demonstrates record-breaking batch film quality

Al2O3 is one of the most common deposited films for applications such as moisture barrier for image sensors and displays. SiO2 thin film is widely used in the manufacturing process of for example logic chips as spacer or multipattern applications. Sensitive substrates can require low deposition temperature or low thermal budget without compromising the film quality, which is one of the challenges the company wanted to address with PICOSUN® Sprinter. Al 2 O 3is one of the most common deposited...

Finland, 19/05/2021 (informazione.news - comunicati stampa - scienza e tecnologia)

Al O is one of the most common deposited films for applications such as moisture barrier for image sensors and displays. SiO thin film is widely used in the manufacturing process of for example logic chips as spacer or multipattern applications. Sensitive substrates can require low deposition temperature or low thermal budget without compromising the film quality, which is one of the challenges the company wanted to address with PICOSUN Sprinter.

"Picosun Group launched Sprinter, the fast batch ALD tool for 300 mm wafers, in December 2020 . We wanted to bring single wafer film quality and uniformity for fast batch processing and meet the challenges in high volume ALD manufacturing. Our solution has gained strong interest in the market and we are already delivering a number of Sprinter ALD systems to customers", says Juhana Kostamo , Vice President, Industrial Business Area of Picosun Group.